Plasma deposition and etching reactors for semiconductor applications

Articles in the same Issue

1. State of the art of plasma chemical synthesis of homogenous and heterogenous products
2. Thermal plasma technology for processing of refractory materials
3. Progress in the kinetics of chemical reactions in non-equilibrium plasmas
4. Plasma sampling - a versatile tool in plasma chemistry
5. Plasma deposition and etching reactors for semiconductor applications
6. The prediction of thermochemical and kinetic data for gas phase reactions. Current status
7. Energy transport in thermal plasmas
8. Thermal plasma in extractive metallurgy
9. Plasma processing of oxide systems in the temperature range 1000-3000 K
10. The measurements of velocity in hot media
11. New studies of the mechanisms of some transfer and propagation reactions
12. Past, present and future role of polyurethanes for surgical implants
13. Some aspects of catalytic activity and stereochemistry in macromolecular systems
14. From polymers to polymeric carbon - a way to synthesize a large variety of new materials
15. Preparation and application of water-soluble polymer-metal complexes
16. Mechanism of ring-opening polymerization of cycloalkenes initiated by metathesis catalysts
17. Dynamic thermomechanometry of aromatic polymers
18. Macromolecular dyes. Oligomeric and unsaturated dyes for U.V. curing
19. Electrochemical polymerization and deposition on carbon fibers